HORIBA Scientific Announces its New DiP Innovation for Depth Profiling by GD-OES

Skip to Navigation


  • Published: Jul 6, 2016
  • Source: HORIBA Scientific
  • Channels: Atomic
thumbnail image: HORIBA Scientific Announces its New DiP Innovation for Depth Profiling by GD-OES

Edison, NJ. June 29, 2016.

HORIBA Scientific, global leader in elemental analysis systems and solutions, just announced its new DiP innovation for Depth Profiling by Glow Discharge Optical Emission Spectrometry (GD-OES).

DiP (Differential interferometry Profiling) provides real time layer thickness, crater depth and sputter rate during Depth Profile Analysis without calibration.

GD-OES is a recognized technique for fast, multi-elemental depth profiling of conductive and non-conductive materials. GD-OES relies on plasma for the sputtering of a representative area of the investigated specimen and on a high resolution spectrometer for the simultaneous measurement of all elements of interest. The sputtering rates in GD-OES are material dependant and when multi-layers are measured, they change with depth. Previously, the estimation of these sputtering rates – required for accurate quantification – was the result of calculations (prone to uncertainties) or external measurements.

The introduction of the patented “DiP” system – Differential interferometry Profiling – within the GD-OES instruments offers in situ direct measurement of the thickness of the layers.

DiP now provides in real time, during sputtering, and without calibration:

  • The crater depth
  • The thickness of layers
  • The sputtering rates

In the DiP system, 2 beams issued from the same laser source are directed for one towards the middle of the GD crater and for the other one towards the intact surface of the sample close to the GD crater. If the material is reflective enough, the reflected beams are collected and measured giving precise measurement of the erosion rates, of the thickness of the layers and of the crater depth.

DiP is ideal notably for reflective surfaces and materials such as PVD coatings, LED, coatings on Si, etc. where Spectroscopic Ellipsometry, also available from HORIBA Scientific, requires transparent layers.

“We designed DiP so it can be retrofitted on our existing GD-OES instruments,” stated Patrick Chapon, GD Product Manager for HORIBA Scientific. “Since the design of the optical interface does not modify the light throughput towards the spectrometers, our customers can easily upgrade and enhance their capabilities.”

For more information on DiP and our GD-OES products, please click here.

Social Links

Share This Links

Bookmark and Share


Suppliers Selection
Societies Selection

Banner Ad

Click here to see
all job opportunities

Copyright Information

Interested in separation science? Visit our sister site separationsNOW.com

Copyright © 2018 John Wiley & Sons, Inc. All Rights Reserved